Canon has launched the FPA-8000iW, which it describes as the first Canon semiconductor lithography system to support manufacturing using large panels that are common in back-end processing.
Integrating a proprietary projection optical system, the FPA-8000iW i-line stepper offers a wide exposure field and fine 1 µm† pattern resolution.
The FPA-8000iW was designed to meet the needs of manufacturers aiming for high production efficiency through the use of 515 x 510 mm organic panel substrates for Panel Level Packaging (PLP) applications. [Read more…] about Canon launches new semiconductor lithography system