N10nm pattern generation using thermal scanning probe lithography enabled by simplified materials and processes, says SwissLitho
Thermal scanning probe lithography (tSPL) has been used to create patterns with sub-20 nm half-pitch resolution.
Pattern generation uses a thermally sensitive resist and spin coatable hard mask materials to transfer the resist patterns.
Spin coatable materials permit users of tSPL to reduce time and cost of the patterning process. [Read more…] about SwissLitho develops more simple technique for nano-lithography
