The Fraunhofer Institute for Photonic Microsystems (IPMS), in collaboration with DIVE imaging systems, has achieved a major milestone in resource-efficient semiconductor manufacturing.
With the successful installation of an optical measurement system by DIVE in the cleanroom of Fraunhofer IPMS, the effort required for quality control during wafer production has been significantly reduced. This collaboration paves the way for a more sustainable and efficient semiconductor production process.
Semiconductor manufacturing involves up to 1,500 process steps, including etching, deposition and lithography. Due to their complexity of structures, finished wafers must be nearly defect-free, which requires rigorous quality control. [Read more…] about Fraunhofer develops ‘resource-efficient’ measurement system for semiconductor wafer production